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contributor.authorDao, Toan Thanhen_US
contributor.authorMurata, Hideyukien_US
date.accessioned2015-07-30T08:12:45Z-
date.available2015-07-30T08:12:45Z-
date.issued2015-05-01en_US
identifier.urihttp://hdl.handle.net/10119/12866-
description.abstractWe have demonstrated tunable n-channel fullerene and p-channel pentacene OFETs and CMOS inverter circuit based on a bilayer-dielectric structure of CYTOP (poly(perfluoroalkenyl vinyl ether)) electret and SiO_2. For both OFET types, the V_<th> can be electrically tuned thanks to the charge-trapping at the interface of CYTOP and SiO_2. The stability of the shifted V_<th> was investigated through monitoring a change in transistor current. The measured transistor current versus time after programming fitted very well with a stretched-exponential distribution with a long time constant up to 10^6 s. For organic CMOS inverter, after applying the program gate voltages for n-channel fullerene or p-channel pentacene elements, the voltage transfer characteristics were shifted toward more positive values, resulting in a modulation of the noise margin. We realized that at a program gate voltage of 60 V for p-channel OFET, the circuit switched at 4, 8 V, that is close to half supply voltage V_<DD>, leading to the maximum electrical noise immunity of the inverter circuit.en_US
format.extent1124273 bytes-
format.mimetypeapplication/pdf-
language.isoenen_US
publisher電子情報通信学会en_US
rightsCopyright (C)2015 IEICE. Toan Thanh Dao and Hideyuki Murata, IEICE TRANSACTIONS on Electronics, E98-C(5), 2015, 422-428. http://www.ieice.org/jpn/trans_online/en_US
subjectcontrollable threshold voltageen_US
subjectstretch-exponential equationen_US
subjectnoise margin enhancementen_US
subjectorganic CMOS inverteren_US
titleTunable Threshold Voltage of Organic CMOS Inverter Circuits by Electron Trapping in Bilayer Gate Dielectricsen_US
type.niiJournal Articleen_US
identifier.niiissn0916-8524en_US
identifier.jtitleIEICE TRANSACTIONS on Electronicsen_US
identifier.volumeE98-Cen_US
identifier.issue5en_US
identifier.spage422en_US
identifier.epage428en_US
relation.doi10.1587/transele.E98.C.422en_US
rights.textversionpublisheren_US
language.iso639-2engen_US
出現コレクション:c10-1. 雑誌掲載論文 (Journal Articles)

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