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Master of Science（Materials Science） >
H23) (Jun.2011 - Mar.2012 >
Please use this identifier to cite or link to this item:
https://hdl.handle.net/10119/10383
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| Title: | 有機シリコンと窒素を用い安全性を高めたガスバリア膜の作製 |
| Authors: | 渡部, 五常 |
| Authors(alternative): | わたなべ, ゆきのぶ |
| Keywords: | 触媒化学気相成長法
Cat-CVD
誘導結合プラズマ
ICP
ヘキサメチルジシラザン
HMDS
窒素
N2 |
| Issue Date: | Mar-2012 |
| Description: | Supervisor:松村英樹
マテリアルサイエンス研究科
修士 |
| Title(English): | Gas Barrier Films Prepared by A Novel Hybrid Method Using Cat-CVD and ICP Plasma |
| Authors(English): | Watanabe, Yukinobu |
| Language: | jpn |
| URI: | https://hdl.handle.net/10119/10383 |
| Appears in Collections: | M-MS. 2011年度(H23) (Jun.2011 - Mar.2012)
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Files in This Item:
| File |
Description |
Size | Format |
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| abstract.pdf | | 90Kb | Adobe PDF | View/Open |
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