JAIST Repository >
c. マテリアルサイエンス研究科・マテリアルサイエンス系 >
c10. 学術雑誌論文等 >
c10-1. 雑誌掲載論文 >

このアイテムの引用には次の識別子を使用してください: http://hdl.handle.net/10119/11458

タイトル: Fabrication of solution-processed hydrogenated amorphous silicon single junction solar cells
著者: Masuda, Takashi
Sotani, Naoya
Hamada, Hiroki
Matsuki, Yasuo
Shimoda, Tatsuya
発行日: 2012-06-22
出版者: American Institute of Physics
誌名: Applied Physics Letters
巻: 100
号: 25
開始ページ: 253908-1
終了ページ: 253908-4
DOI: 10.1063/1.4730614
抄録: Hydrogenated amorphous silicon solar cells were fabricated using solution-based processes. All silicon layers of the p-i-n junction were stacked by a spin-cast method using doped and non-doped polydihydrosilane solutions. Further, a hydrogen-radical treatment under vacuum conditions was employed to reduce spin density in the silicon films. Following this treatment, the electric properties of the silicon films were improved, and the power conversion efficiency of the solar cells was also increased from 0.01% to 0.30%–0.51% under the AM-1.5G (100 mW/cm^2) illumination conditions.
Rights: Copyright 2012 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Takashi Masuda, Naoya Sotani, Hiroki Hamada, Yasuo Matsuki, and Tatsuya Shimoda, Applied Physics Letters, 100(25), 253908 (2012) and may be found at http://dx.doi.org/10.1063/1.4730614
URI: http://hdl.handle.net/10119/11458
資料タイプ: publisher
出現コレクション:c10-1. 雑誌掲載論文 (Journal Articles)

このアイテムのファイル:

ファイル 記述 サイズ形式
18585.pdf666KbAdobe PDF見る/開く

当システムに保管されているアイテムはすべて著作権により保護されています。

 


お問い合わせ先 : 北陸先端科学技術大学院大学 研究推進課図書館情報係