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このアイテムの引用には次の識別子を使用してください:
http://hdl.handle.net/10119/11461
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| タイトル: | Stability of polydihydrosilane liquid films on solid substrates |
| 著者: | Masuda, Takashi
Matsuki, Yasuo
Shimoda, Tatsuya |
| キーワード: | Liquid film
Polysilane
Polydihydrosilane
van der Waals energy
Hamaker constant |
| 発行日: | 2012-03-25 |
| 出版者: | Elsevier |
| 誌名: | Thin Solid Films |
| 巻: | 520 |
| 号: | 15 |
| 開始ページ: | 5091 |
| 終了ページ: | 5096 |
| DOI: | 10.1016/j.tsf.2012.03.043 |
| 抄録: | The quality of polydihydrosilane liquid films is a key factor in the fabrication of solution-processed silicon films. This study investigates the stability of polydihydrosilane liquid films with a thickness L of ～ 40 nm on solid substrates by a comparison between the observed optical microscope images and the values of the Hamaker constant A_<ALS> for the air/liquid (polydihydrosilane)/solid substrate systems. A_<ALS> values for a series of SiO_2-based substrates were determined by adopting a simple spectrum method. We found that the micrographs of the polydihydrosilane films provide direct evidence of stability in accordance with the sign of A_<ALS>; a stable liquid film with A_<ALS> > 0 showed a continuous figure, while an unstable film with A_<ALS> < 0 exhibited an array of dots caused by the rupture of the film. The array of dots in the unstable liquid films has a slight orderly distribution with a period λ that is in accord with the characteristic wavelength of the undulation related to the spinodal-like decomposition in van der Waals unstable liquid. |
| Rights: | NOTICE: This is the author's version of a work accepted for publication by Elsevier. Takashi Masuda, Yasuo Matsuki, Tatsuya Shimoda, Thin Solid Films, 520(15), 2012, 5091-5096, http://dx.doi.org/10.1016/j.tsf.2012.03.043 |
| URI: | http://hdl.handle.net/10119/11461 |
| 資料タイプ: | author |
| 出現コレクション: | c10-1. 雑誌掲載論文 (Journal Articles)
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このアイテムのファイル:
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