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Please use this identifier to cite or link to this item: http://hdl.handle.net/10119/11461

Title: Stability of polydihydrosilane liquid films on solid substrates
Authors: Masuda, Takashi
Matsuki, Yasuo
Shimoda, Tatsuya
Keywords: Liquid film
Polysilane
Polydihydrosilane
van der Waals energy
Hamaker constant
Issue Date: 2012-03-25
Publisher: Elsevier
Magazine name: Thin Solid Films
Volume: 520
Number: 15
Start page: 5091
End page: 5096
DOI: 10.1016/j.tsf.2012.03.043
Abstract: The quality of polydihydrosilane liquid films is a key factor in the fabrication of solution-processed silicon films. This study investigates the stability of polydihydrosilane liquid films with a thickness L of ~ 40 nm on solid substrates by a comparison between the observed optical microscope images and the values of the Hamaker constant A_<ALS> for the air/liquid (polydihydrosilane)/solid substrate systems. A_<ALS> values for a series of SiO_2-based substrates were determined by adopting a simple spectrum method. We found that the micrographs of the polydihydrosilane films provide direct evidence of stability in accordance with the sign of A_<ALS>; a stable liquid film with A_<ALS> > 0 showed a continuous figure, while an unstable film with A_<ALS> < 0 exhibited an array of dots caused by the rupture of the film. The array of dots in the unstable liquid films has a slight orderly distribution with a period λ that is in accord with the characteristic wavelength of the undulation related to the spinodal-like decomposition in van der Waals unstable liquid.
Rights: NOTICE: This is the author's version of a work accepted for publication by Elsevier. Takashi Masuda, Yasuo Matsuki, Tatsuya Shimoda, Thin Solid Films, 520(15), 2012, 5091-5096, http://dx.doi.org/10.1016/j.tsf.2012.03.043
URI: http://hdl.handle.net/10119/11461
Material Type: author
Appears in Collections:c10-1. 雑誌掲載論文 (Journal Articles)

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