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Please use this identifier to cite or link to this item: http://hdl.handle.net/10119/11938

Title: Raman spectral analysis of Si films solid-phase-crystallized on glass substrates using pulse laser with crystallization-induction layers of yttria-stabilized zirconia
Authors: Mai, Thi Kieu Lien
Horita, Susumu
Issue Date: 2014-02-06
Publisher: IOP Publishing
Magazine name: Japanese Journal of Applied Physics
Volume: 53
Number: 3S1
Start page: 03CB01-1
End page: 03CB01-7
DOI: 10.7567/JJAP.53.03CB01
Abstract: The solid-phase crystallization of amorphous Si films with/without a crystallization-induction (CI) layer of yttria-stabilized zirconia (YSZ) was performed using a Nd:YAG pulse laser. We investigated the crystallinity of the Si films by Raman spectroscopy. It was found that, at the same crystalline fraction, the FWHM of the c-Si peak for Si/YSZ/glass was smaller than that for Si/glass. The result is considered owing to the CI effect of the YSZ layer. This was confirmed by scanning electron microscopy observation, which showed that the grain size of Si on YSZ layers was more uniform than that on glass substrates. On the other hand, at a lower beam energy, the crystalline quality of the Si films was found to be better although the increase in the crystallization rate with the pulse number N is smaller. On the basis of the above results, the crystallization model of an a-Si film on a YSZ layer is speculated.
Rights: This is the author's version of the work. It is posted here by permission of The Japan Society of Applied Physics. Copyright (C) 2014 The Japan Society of Applied Physics. Mai Thi Kieu Lien and Susumu Horita, Japanese Journal of Applied Physics, 53(3S1), 2014, 03CB01-1-03CB01-7. http://dx.doi.org/10.7567/JJAP.53.03CB01
URI: http://hdl.handle.net/10119/11938
Material Type: author
Appears in Collections:c10-1. 雑誌掲載論文 (Journal Articles)

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