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Please use this identifier to cite or link to this item: http://hdl.handle.net/10119/13573

Title: 溶液プロセスによる高品質LnZrO絶縁膜の開発
Authors: 下野, 和輝
Authors(alternative): しもの, かずき
Keywords: 溶液プロセス
solution process
薄膜トランジスタ
thin film transistor
ゲート絶縁膜
gate insulator
金属酸化物
metal oxide
Issue Date: Mar-2016
Description: Supervisor:下田 達也
マテリアルサイエンス研究科
修士
Title(English): Development of High-Quality LnZrO Insulating Films via a Solution Process
Authors(English): Shimono, Kazuki
Language: jpn
URI: http://hdl.handle.net/10119/13573
Appears in Collections:M-MS. 2015年度(H27) (Jun.2015 - Mar.2016)

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