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このアイテムの引用には次の識別子を使用してください: http://hdl.handle.net/10119/14725

タイトル: Influence of the oxide thickness of a SiO_2/Si(001) substrate on the optical second harmonic intensity of few-layer MoSe_2
著者: Miyauchi, Yoshihiro
Morishita, Ryo
Tanaka, Masatoshi
Ohno, Sinya
Mizutani, Goro
Suzuki, Takanori
キーワード: Optical Second Harmonic Generation
oxide layer
thickness dependence
発行日: 2016-07-08
出版者: The Japan Society of Applied Physics
誌名: Japanese Journal of Applied Physics
巻: 55
号: 8
開始ページ: 085801-1
終了ページ: 085801-4
DOI: 10.7567/JJAP.55.085801
抄録: The nonlinear optical properties of few-layer MoSe_2 on a SiO_2/Si substrate were investigated with our optical second harmonic generation (SHG) microscope. Few-layer flakes were mechanically exfoliated from a single crystal onto a 90- or 270-nm-thick SiO_2-coated Si(001) substrate. The polar plot of the second-harmonic (SH) intensity from a mono- or trilayer MoSe_2 flake as a function of the rotation angle of incident polarization shows a threefold symmetry, indicating that the isolated few-layer flakes retain their single crystallographic orientation. SHG spectra were found to depend strongly on the oxide thickness of the substrate (90 or 270 nm), which was interpreted using the interference among the multiply reflected SH light beams in the system. By taking this interference into account, a resonant peak may be identified at a two-photon energy of equal to or less than 2.9 eV in an SHG spectrum. The spatial resolution of the SHG microscope was estimated as 0.53 μm.
Rights: This is the author's version of the work. It is posted here by permission of The Japan Society of Applied Physics. Copyright (C) 2016 The Japan Society of Applied Physics. Yoshihiro Miyauchi, Ryo Morishita, Masatoshi Tanaka, Sinya Ohno, Goro Mizutani, and Takanori Suzuki, Japanese Journal of Applied Physics, 55(8), 2016, 085801-1-085801-4. http://dx.doi.org/10.7567/JJAP.55.085801
URI: http://hdl.handle.net/10119/14725
資料タイプ: author
出現コレクション:c10-1. 雑誌掲載論文 (Journal Articles)


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