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このアイテムの引用には次の識別子を使用してください: http://hdl.handle.net/10119/15727

タイトル: Multilayer Growth of Porphyrin-Based Polyurea Thin Film Using Solution-Based Molecular Layer Deposition Technique
著者: Uddin, S. M. Nizam
Nagao, Yuki
キーワード: Layer by layer
Covalent network
Relative humidity dependence
Urea coupling reaction
発行日: 2017-10-12
出版者: American Chemical Society
誌名: Langmuir
巻: 33
号: 44
開始ページ: 12777
終了ページ: 12784
DOI: 10.1021/acs.langmuir.7b03450
抄録: Controllable synthesis of organic thin film materials on solid surfaces is a challenging issue in the research field of surface science as it is affected by several physical parameters. In this work, we demonstrated a solution-based molecular layer deposition (MLD) approach to prepare porphyrin-based covalent organic molecular networks on a 3-aminopropyl trimethoxysilane (APTMS) modified substrate surface using the urea coupling reaction between 1,4-phenylene diisocyanate (1,4-PDI) and 5,10,15,20-tetrakis-(4-aminophenyl) porphyrin (H_2TAPP) at room temperature (22 ± 2 ºC). Multilayer growth was investigated under different relative humidity (RH) conditions of the reaction chamber. Sequential molecular growth at low relative humidity (≤10% RH) was observed using UV-vis absorption spectroscopy and atomic force microscopy (AFM). The high-RH condition shows limited film growth. Infrared spectroscopy (IR) and X-ray photoelectron spectroscopy (XPS) revealed the polyurea bond formation in sequential multilayer thin films, demonstrating that stepwise multilayer film growth was achieved using the urea coupling reaction.
Rights: S. M. Nizam Uddin and Yuki Nagao, Langmuir, 2017, 33(44), pp.12777-12784. This document is the unedited author's version of a Submitted Work that was subsequently accepted for publication in Langmuir, copyright (c) American Chemical Society after peer review. To access the final edited and published work, see http://dx.doi.org/10.1021/acs.langmuir.7b03450
URI: http://hdl.handle.net/10119/15727
資料タイプ: author
出現コレクション:c10-1. 雑誌掲載論文 (Journal Articles)

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