JAIST Repository >
Theses >
Doctor of Philosophy(Materials Science) >
H30) (Jun.2018 - Mar.2019 >

Please use this identifier to cite or link to this item: http://hdl.handle.net/10119/15761

Title: 超薄Mo1-XNbxS2層の作製と熱電物性の研究
Authors: Pham, Thi Xuan
Authors(alternative): ふぁむ, てぃ すん
Keywords: MoS2
thermoelectric properties
ultrathin layer
weak localization
first-principles calculations
Issue Date: Dec-2018
Description: Supervisor:小矢野 幹夫
Title(English): Fabrication and Thermoelectric Properties of Ultrathin Layer of Mo1-xNbxS2
Authors(English): Pham, Thi Xuan
Language: eng
URI: http://hdl.handle.net/10119/15761
Academic Degrees and number: 甲第1109号
Degree-granting date: 2018-12-21
Degree name: 博士(マテリアルサイエンス)
Degree-granting institutions: 北陸先端科学技術大学院大学
Appears in Collections:D-MS. 2018年度(H30) (Jun.2018 - Mar.2019)

Files in This Item:

File Description SizeFormat
abstract.pdf要旨639KbAdobe PDFView/Open
paper.pdf本文4682KbAdobe PDFView/Open
summary.pdf内容の要旨及び論文審査の結果の要旨1647KbAdobe PDFView/Open

All items in DSpace are protected by copyright, with all rights reserved.


Contact : Library Information Section, Japan Advanced Institute of Science and Technology