|
JAIST Repository >
c. マテリアルサイエンス研究科・マテリアルサイエンス系 >
c10. 学術雑誌論文等 >
c10-1. 雑誌掲載論文 >
このアイテムの引用には次の識別子を使用してください:
http://hdl.handle.net/10119/18795
|
| タイトル: | Study on residual OH content in low-temperature Si oxide films after in situ post-deposition heating (PDH) |
| 著者: | Horita, Susumu
Pu, Di |
| 発行日: | 2023-12-20 |
| 出版者: | IOP Publishing on behalf of the Japan Society of Applied Physics (JSAP) |
| 誌名: | Japanese Journal of Applied Physics |
| 巻: | 63 |
| 号: | 01SP12 |
| 開始ページ: | 1 |
| 終了ページ: | 9 |
| DOI: | 10.35848/1347-4065/acf477 |
| 抄録: | We investigated the post-deposition heating (PDH) effect on OH content in SiOx films deposited by atmospheric-pressure CVD using a deposition source of silicone oil (SO) with O3 and TCE vapor at a temperature Td of 180 °C–250 °C. The PDH is performed in situ for 5 min in the deposition chamber just after film deposition without any supply of SO, where the heating temperature is the same as Td. The OH content in the films deposited normally decreases with increasing Td. In contrast, those with PDH decrease with deceasing Td from 220 °C, and, at Td = 190 °C, a minimum OH content can be obtained. This means that lower OH content remains at a lower deposition temperature. The PDH effect on OH reduction can be explained by easily reconstructible structure of SiOx films deposited at low temperature. Furthermore, we discuss the mechanism of the PDH effect from other points of view. |
| Rights: | Copyright (c) 2023 Authors. Susumu Horita, Di Pu. Japanese Journal of Applied Physics 63, 01SP12 (2024). This is an Open Access article distributed under the terms of Creative Commons Licence CC-BY [https://creativecommons.org/licenses/by/4.0/]. Original publication is available on IOP Science via https://doi.org/10.35848/1347-4065/acf477. |
| URI: | http://hdl.handle.net/10119/18795 |
| 資料タイプ: | publisher |
| 出現コレクション: | c10-1. 雑誌掲載論文 (Journal Articles)
|
このアイテムのファイル:
| ファイル |
記述 |
サイズ | 形式 |
|---|
| S-HORITA-M-1225.pdf | | 1686Kb | Adobe PDF | 見る/開く |
|
当システムに保管されているアイテムはすべて著作権により保護されています。
|
