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Please use this identifier to cite or link to this item: http://hdl.handle.net/10119/2446

Title: ECRスパッタ法によるSrTiO3薄膜のエピタキシャル成長と評価
Authors: 目黒, 伸也
Authors(alternative): めぐろ, しんや
Keywords: ECRスパッタ法,SrTiO3,エピタキシャル膜
ECR sputtering,SrTiO3,epitaxal
Issue Date: Mar-1998
Supervisor:五味 学
Title(English): Groth and evaluation of SrTiO3 thin films deposited by sputtering
Authors(English): Meguro, Shinya
Language: jpn
URI: http://hdl.handle.net/10119/2446
Appears in Collections:M-MS. 1997年度(H09) (Jun.1997 - Mar.1998)

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