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Please use this identifier to cite or link to this item: http://hdl.handle.net/10119/3197

Title: CVD法による共役系高分子膜の作成と分子鎖の配向制御
Authors: 板橋, 敦
Authors(alternative): いたばし, あつし
Keywords: アミノ基終端シリコン, XPS, FT-IR, AFM
NH2-terminated Si(111), XPS, FT-IR, AFM
Issue Date: Mar-2005
Supervisor:村田 英幸
Title(English): Fabrication of NH2-terminated Si(111) Substrate for Attaching Functional Organic Molecules to Semiconductor Surface
Authors(English): Itabashi, Atsushi 
URI: http://hdl.handle.net/10119/3197
Appears in Collections:M-MS. 2004年度(H16) (Jun.2004 - Mar.2005)

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