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JAIST Repository >
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Theses >
Master of Science（Materials Science） >
H18) (Jun.2006 - Mar.2007 >
Please use this identifier to cite or link to this item:
http://hdl.handle.net/10119/3671
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| Title: | Cat-CVD法による有機シリコン化合物を用いた大面積ガスバリア膜の作製 |
| Authors: | 小栁津, 拓哉 |
| Authors(alternative): | おやいづ, たくや |
| Keywords: | Cat-CVD, 窒化シリコン,酸窒化シリコン,ガスバリア膜,有機シリコン化合物
Cat-CVD,SiN,SiON,Gas barrier film,Organic silicon compound |
| Issue Date: | Mar-2007 |
| Description: | Supervisor:松村 英樹
材料科学研究科
修士 |
| Title(English): | Formation of Large-Area Gas Barrier Films by Cat-CVD Method Using Organic Silicon Compounds |
| Authors(English): | Oyaidu, Takuya |
| Language: | eng |
| URI: | http://hdl.handle.net/10119/3671 |
| Appears in Collections: | M-MS. 2006年度(H18) (Jun.2006 - Mar.2007)
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Files in This Item:
| File |
Description |
Size | Format |
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| 078abstract.pdf | | 243Kb | Adobe PDF | View/Open |
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