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Please use this identifier to cite or link to this item: http://hdl.handle.net/10119/4192

Title: Cat-CVD法に用いる触媒体の変性とその抑止法に関する基礎研究
Authors: 本田, 和広
Authors(alternative): ほんだ, かずひろ
Keywords: silicide
Issue Date: Mar-2008
Description: Supervisor:松村 英樹
Title(English): Study on Silicidation Process of Tungsten Catalyzer in Catalytic Chemical Vapour Deposition
Authors(English): Honda, Kazuhiro
Language: jpn
URI: http://hdl.handle.net/10119/4192
Appears in Collections:D-MS. 2007年度(H19) (Jun.2007 - Mar.2008)

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