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http://hdl.handle.net/10119/4539
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| タイトル: | High-rate deposition of YBa_2Cu_3O_<7-x> films by hot cluster epitaxy |
| 著者: | Takamura, Yuzuru
Yamaguchi, Norio
Terashima, Kazuo
Yoshida, Toyonobu |
| 発行日: | 1998-11-01 |
| 出版者: | American Institute of Physics |
| 誌名: | Journal of Applied Physics |
| 巻: | 84 |
| 号: | 9 |
| 開始ページ: | 5084 |
| 終了ページ: | 5088 |
| DOI: | 10.1063/1.368757 |
| 抄録: | The growth rate and crystallinity of YBa_2Cu_3O_<7 - x> (YBCO) films were investigated in connection with the cluster size and the growth mode in order to clarify the high-rate deposition of high-quality epitaxial films from clusters in the plasma flash evaporation method. The films were deposited from clusters that were not accelerated by bias voltage but were self-activated in a thermal plasma. With increasing cluster size, the growth rate increased drastically at the point of the growth mode transition from spiral to two-dimensional cluster nucleus growth. After the transition, the film was still well epitaxial and have the minimum value of the full width at half maximum of the (005) x-ray rocking curve (FWHM_<rc>). A 1-μm-thick, nonspiral growth, monolayer smooth epitaxial YBCO film was successfully deposited at a growth rate of 16 nm/s. FWHM_<rc> for the films was less than 0.14°. It was revealed experimentally that the deposition from "hot" clusters with large sticking probability onto a high-temperature substrate is highly effective for the deposition of high-quality films at a high rate. |
| Rights: | Copyright 1998 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Y. Takamura, N. Yamaguchi, K. Terashima, T. Yoshida, Journal of Applied Physics, 84(9), 5084-5088 (1998) and may be found at http://link.aip.org/link/?JAPIAU/84/5084/1 |
| URI: | http://hdl.handle.net/10119/4539 |
| 資料タイプ: | publisher |
| 出現コレクション: | c10-1. 雑誌掲載論文 (Journal Articles)
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