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このアイテムの引用には次の識別子を使用してください: http://hdl.handle.net/10119/4543

タイトル: Scanning tunneling microscopy of epitaxial YBa_2Cu_3O_<7-x> films prepared by thermal plasma flash evaporation method
著者: Hayasaki, Kei
Takamura, Yuzuru
Yamaguchi, Norio
Terashima, Kazuo
Yoshida, Toyonobu
発行日: 1997-02-01
出版者: American Institute of Physics
誌名: Journal of Applied Physics
巻: 81
号: 3
開始ページ: 1222
終了ページ: 1226
DOI: 10.1063/1.364143
抄録: The surface morphology of epitaxial YBa_2Cu_3O_<7 - x> films prepared by thermal plasma flash evaporation was extensively investigated by scanning tunneling microscopy. Under epitaxial film growth conditions with the deposition rate up to 0.42 μm/min, two-dimensional nucleus growth and spiral growth were observed. The main deposition species in this process was found to be the cluster ranging from 0.3 to 9 nm and the size of the cluster influenced the growth mode strongly. Theoretical analysis based on the two-dimensional critical radius revealed that smaller clusters became weakly bonded nuclei resulting in spiral growth and larger clusters became stable nuclei resulting in two-dimensional nucleus growth, which we named two-dimensional cluster nucleus growth. The clusters generated in the plasma boundary layer undoubtedly involve sufficient energy necessary for crystallization and show quite different characteristics from those of the clusters generated in vacuum by adiabatic expansion process. Hence, this process must be named "hot cluster epitaxy."
Rights: Copyright 1997 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in K. Hayasaki, Y. Takamura, N. Yamaguchi, K. Terashima, T. Yoshida, Journal of Applied Physics, 81(3), 1222-1226 (1997) and may be found at http://link.aip.org/link/?JAPIAU/81/1222/1
URI: http://hdl.handle.net/10119/4543
資料タイプ: publisher
出現コレクション:c10-1. 雑誌掲載論文 (Journal Articles)

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