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Doctor of Philosophy（Materials Science） >
H20) (Jun.2008 - Mar.2009 >
Please use this identifier to cite or link to this item:
https://hdl.handle.net/10119/8005
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| Title: | Cat-CVD法を用いて作製する薄膜トランジスタの研究 |
| Authors: | 西崎, 昭吾 |
| Authors(alternative): | にしざき, しょうご |
| Keywords: | 触媒化学気相成長法
Cat-CVD |
| Issue Date: | Mar-2009 |
| Description: | Supervisor:松村英樹 教授
マテリアルサイエンス研究科
博士 |
| Title(English): | Fabrication of a-Si TFTs by Catalytic Chemical Vapor Deposition (Cat-CVD) |
| Authors(English): | Nishizaki, Shogo |
| Language: | jpn |
| URI: | https://hdl.handle.net/10119/8005 |
| Appears in Collections: | D-MS. 2008年度(H20) (Jun.2008 - Mar.2009)
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Files in This Item:
| File |
Description |
Size | Format |
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| abstract.pdf | | 150Kb | Adobe PDF | View/Open |
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