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Please use this identifier to cite or link to this item: http://hdl.handle.net/10119/9201

Title: Fabrication of a submicron patterned electrode using an electrospun single fiber as a shadow-mask
Authors: Ishii, Yuya
Sakai, Heisuke
Murata, Hideyuki
Keywords: Electrospinning
Submicron-gap patterned electrode
Single fiber
Shadow-mask
Issue Date: 2009-07-11
Publisher: Elsevier
Magazine name: Thin Solid Films
Volume: 518
Number: 2
Start page: 647
End page: 650
DOI: 10.1016/j.tsf.2009.07.061
Abstract: We realize a uniform submicron-gap electrode by using an electrospun single fiber as a shadow-mask. By stretching an electrospun fiber, we can decrease the diameter of the fiber from 2 μm to 564 nm with its standard deviation of 57.7 nm. We place the fiber on the center of a Si/SiO_2 substrate followed by the deposition of a molybdenum trioxide adhesion layer and Au electrode. After removing the fiber from the Si/SiO_2 substrate, the submicron-gap gold electrode is formed. Characterization of the gap with scanning electron microscope revealed that the gap has a good uniformity; the average gap length is 865 nm throughout 2 mm gap width.
Rights: NOTICE: This is the author's version of a work accepted for publication by Elsevier. Yuya Ishii, Heisuke Sakai, and Hideyuki Murata, Thin Solid Films, 518(2), 2009, 647-650, http://dx.doi.org/10.1016/j.tsf.2009.07.061
URI: http://hdl.handle.net/10119/9201
Material Type: author
Appears in Collections:c10-1. 雑誌掲載論文 (Journal Articles)

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