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このアイテムの引用には次の識別子を使用してください: http://hdl.handle.net/10119/12278

タイトル: Rheology Printing for Metal-Oxide Patterns and Devices
著者: Kaneda, Toshihiko
Hirose, Daisuke
Miyasako, Takaaki
Tue, Phan Trong
Murakami, Yoshitaka
Kohara, Shinji
Li, Jinwang
Mitani, Tadaoki
Tokumitsu, Eisuke
Shimoda, Tatsuya
発行日: 2013-11-01
出版者: Royal Society of Chemistry
誌名: Journal of Materials Chemistry C
巻: 2
号: 1
開始ページ: 40
終了ページ: 49
DOI: 10.1039/C3TC31842G
抄録: Technologies of device printing have been widely explored, but existing printing techniques still cannot produce well-defined patterns required by fine electronic devices. Here, a new printing method is proposed and the printing of metal-oxide patterns with well-defined shapes was demonstrated. Excellent thin-film transistors with channel lengths around 500 nm were completely printed by this method in an air atmosphere. This printing utilizes a viscoelastic transformation of the precursor gel when imprinted; it softens at a certain temperature during thermal-imprinting so that the gel can be rheologically imprinted. The imprinted pattern shows very small shrinkage during post-annealing, thereby achieving a high shape fidelity to the mould; this results from metal-oxide condensation at imprinting. The viscoelastic transformation and metal-oxide condensation at imprinting constitute the basis for this printing method, which is closely related to the cluster structure in the precursor gel. This method has worked for patterns down to several tens of nanometers.
Rights: Copyright (C) 2013 Royal Society of Chemistry. Toshihiko Kaneda, Daisuke Hirose, Takaaki Miyasako, Phan Trong Tue, Yoshitaka Murakami, Shinji Kohara, Jinwang Li, Tadaoki Mitani, Eisuke Tokumitsu, and Tatsuya Shimoda, Journal of Materials Chemistry C, 2(1), 2013, 40-49. http://dx.doi.org/10.1039/C3TC31842G - Reproduced by permission of The Royal Society of Chemistry
URI: http://hdl.handle.net/10119/12278
資料タイプ: author
出現コレクション:z8-10-1. 雑誌掲載論文 (Journal Articles)


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