| 
JAIST Repository >
c. マテリアルサイエンス研究科・マテリアルサイエンス系 >
 c10. 学術雑誌論文等 >
 c10-1. 雑誌掲載論文 >
 
        
        
        
            | このアイテムの引用には次の識別子を使用してください: http://hdl.handle.net/10119/16141 |  
 
| タイトル: | Indium tin oxide sputtering damage to catalytic chemical vapor deposited amorphous silicon passivation films and its recovery |  | 著者: | Konishi, Takeo Ohdaira, Keisuke
 |  | キーワード: | Passivation Sputtering
 Cat-CVD
 ITO
 Silicon heterojunction solar cells
 |  | 発行日: | 2017-01-12 |  | 出版者: | Elsevier |  | 誌名: | Thin Solid Films |  | 巻: | 635 |  | 開始ページ: | 73 |  | 終了ページ: | 77 |  | DOI: | 10.1016/j.tsf.2017.01.021 |  | 抄録: | We investigated the influence of indium tin oxide (ITO) sputtering damage to various types of amorphous silicon (a-Si) passivation films deposited by catalytic chemical vapor deposition. Intrinsic (i-) a-Si, n-type (n-) a-Si/i-a-Si, and p-type (p-) a-Si/i-a-Si stacked films were prepared on crystalline Si, and ITO was sputtered at various temperatures and RF powers, followed by post-annealing at 200 °C. Effective minority carrier lifetime (τ_<eff>) of almost all the samples decreases drastically after sputtering, while τ_<eff> of the samples with ITO sputtered at room temperature recovers significantly by post-annealing. Annealing before sputtering and sputtering at lower RF power leads to more effective recovery of τ_<eff>. The samples with ITO sputtered to an n-a-Si/i-a-Si stack show large τ_<eff> recovery, while the samples with ITO sputtered to a p-a-Si/i-a-Si stack show much smaller τ_<eff> recovery. Τeff recovery after ITO sputtering thus depends on the types of a-Si passivation films, which may be related to the modification of band alignment by the existence of ITO. |  | Rights: | Copyright (C)2017, Elsevier. Licensed under the Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International license (CC BY-NC-ND 4.0). [http://creativecommons.org/licenses/by-nc-nd/4.0/] NOTICE: This is the author's version of a work accepted for publication by Elsevier. Takeo Konishi and Keisuke Ohdaira, Thin Solid Films, 635, 2017, 73-77, http://dx.doi.org/10.1016/j.tsf.2017.01.021 |  | URI: | http://hdl.handle.net/10119/16141 |  | 資料タイプ: | author |  | 出現コレクション: | c10-1. 雑誌掲載論文 (Journal Articles) 
 |  
 | このアイテムのファイル: | ファイル | 記述 | サイズ | 形式 | 
|---|
 | 3033.pdf |  | 258Kb | Adobe PDF | 見る/開く | 
 | 
 
    
     当システムに保管されているアイテムはすべて著作権により保護されています。   |