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http://hdl.handle.net/10119/18174
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| Title: | Crystallization of catalytic CVD hydrogenated n-a-Si films on textured glass substrates by flash lamp annealing |
| Authors: | Wang, Zheng
Huynh, Tu Thi Cam
Ohdaira, Keisuke |
| Issue Date: | 2022-01-28 |
| Publisher: | IOP Publishing |
| Magazine name: | Japanese Journal of Applied Physics |
| Volume: | 61 |
| Number: | SB |
| Start page: | SB1019-1 |
| End page: | SB1019-4 |
| DOI: | 10.35848/1347-4065/ac290e |
| Abstract: | Flash lamp annealing (FLA) is a short-duration annealing technique and can crystallize amorphous silicon (a-Si) films for thin-film polycrystalline Si (poly-Si) solar cells. We investigated the crystallization of n-type hydrogenated a-Si (n-a-Si:H) films formed by catalytic chemical vapor deposition (Cat-CVD) on Si nitride- (SiN_x-) coated textured glass substrates. The n-a-Si:H films with a thickness of ∼2.7 µm were crystallized by FLA with no film peeling even without chromium adhesion layers. We also confirmed that the crystallization takes place through explosive crystallization (EC). The addition of phosphorous to the precursor a-Si:H slightly modifies the crystallization, resulting in different grain size and EC velocity compared to the case of EC of intrinsic a-Si:H. |
| Rights: | This is the author's version of the work. It is posted here by permission of The Japan Society of Applied Physics. Copyright (C)2022 The Japan Society of Applied Physics. Zheng Wang, Huynh Thi Cam Tu, Keisuke Ohdaira, Japanese Journal of Applied Physics, 61(SB), 2022, SB1019-1-SB1019-4. http://dx.doi.org/10.35848/1347-4065/ac290e |
| URI: | http://hdl.handle.net/10119/18174 |
| Material Type: | author |
| Appears in Collections: | c10-1. 雑誌掲載論文 (Journal Articles)
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| WANG_clean version.pdf | | 1113Kb | Adobe PDF | View/Open |
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