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Please use this identifier to cite or link to this item: http://hdl.handle.net/10119/4880

Title: Solution-processed silicon films and transistors
Authors: Shimoda, Tatsuya
Matsuki, Yasuo
Furusawa, Masahiro
Aoki, Takashi
Yudasaka, Ichio
Tanaka, Hideki
Iwasawa, Haruo
Wang, Daohai
Miyasaka, Masami
Takeuchi, Yasumasa
Issue Date: 2006-04-06
Publisher: Nature Publishing Group
Magazine name: Nature
Volume: 440
Number: 7085
Start page: 783
End page: 786
DOI: 10.1038/nature04613
Abstract: Solution processes for electronic devices, instead of conventional vacuum process and vapour deposition, have been receiving considerable attention for a wide range of applications such as electroluminescent displays^<1, 2>, solar cells^3, ferroelectric films^4, transparent conductive films^5, SiO_2 films^6 and metal films^7, to reduce the processing cost. In particular, printing semiconductor devices using liquid materials is considered to be important for new applications, such as large-area flexible displays. Recent research has been focused on organic semiconductors^<8-11>, which have mobilities comparable to that of amorphous silicon (α-Si)^11, but are insufficiently reliable. Solution processing of metal chalcogenide semiconductors to fabricate stable and high-performance transistors has also been reported^<12, 13>. This class of materials is targeted as substitutions for the silicon devices that requiree complex and expensive manufacturing processes. However, if high-quality silicon film could be prepared by solution process, this situation would change drastically. Here we demonstrate the solution process of silicon thin film transistors (TFTs) using a novel liquid precursor. We have formed poly-crystalline silicon (poly-Si) films by spin-coating or by ink-jetting the precursor to fabricate TFTs that operated with a mobilities of 108 cm^2V^<-1>s^<-1> and 6.5 cm^2V^<-1>s^<-1>, respectively. These values cannot be achieved by solution-processed organic TFTs or α-Si TFTs, whose mobility is 1 cm^2V^<-1>s^<-1> at most.
Rights: This is the author's version of the work. Copyright (C) 2006 Nature Publishing Group. Tatsuya Shimoda, Yasuo Matsuki, Masahiro Furusawa, Takashi Aoki, Ichio Yudasaka, Hideki Tanaka, Haruo Iwasawa, Daohai Wang, Masami Miyasaka and Yasumasa Takeuchi, Nature, 440(7085), 2006, 783-786. http://dx.doi.org/10.1038/nature04613
URI: http://hdl.handle.net/10119/4880
Material Type: author
Appears in Collections:g10-1. 雑誌掲載論文 (Journal Articles)

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