JAIST Repository >
a. 知識科学研究科・知識科学系 >
a10. 学術雑誌論文等 >
a10-1. 雑誌掲載論文 >

このアイテムの引用には次の識別子を使用してください: http://hdl.handle.net/10119/5003

タイトル: A WN_x Gate Self-Aligned GaAs p-Channel MESFET for Complementary Logic
著者: Woodhead, Jonathan
Uchitomi, Naotaka
Kameyama, Atushi
Ikawa, Yasuo
Toyoda, Nobuyuki
発行日: 1987-02
出版者: Institute of Electrical and Electronics Engineers (IEEE)
誌名: IEEE Transactions on Electron Devices
巻: 34
号: 2
開始ページ: 170
終了ページ: 174
抄録: The Schottky barrier of reactively sputtered WN_x to p-type GaAs has been investigated. Postdeposition heat treatments above 500°C led to a reduction in the barrier height but for lamp annealing at 740°C the barrier heights are 0.68 eV. Self-aligned p-channel MESFET's were fabricated with WN_x gates by a refractory metal process involving the above heat treatment. The Schottky-barrier heights were close to the expected values. K-values of FET's with 2 μm × 24 μm gates were 0.088 mA/V^2, consistent with previously reported results. SPICE simulation studies carried out for a variety of complementary-type logic gates, indicate that power dissipation × delay time products of less than 10 fJ may be achievable over the power range 5-50 μW/gate. Thus complementary logic may be useful for applications where low power dissipation is at a premium.
Rights: Copyright (C)1987 IEEE. Reprinted from IEEE Transactions on Electron Devices, 34(2), 1987, 170-174. This material is posted here with permission of the IEEE. Such permission of the IEEE does not in any way imply IEEE endorsement of any of JAIST's products or services. Internal or personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution must be obtained from the IEEE by writing to pubs-permissions@ieee.org. By choosing to view this document, you agree to all provisions of the copyright laws protecting it.
URI: http://hdl.handle.net/10119/5003
資料タイプ: publisher
出現コレクション:a10-1. 雑誌掲載論文 (Journal Articles)

このアイテムのファイル:

ファイル 記述 サイズ形式
B10913.pdf652KbAdobe PDF見る/開く

当システムに保管されているアイテムはすべて著作権により保護されています。

 


お問い合わせ先 : 北陸先端科学技術大学院大学 研究推進課図書館情報係