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このアイテムの引用には次の識別子を使用してください: http://hdl.handle.net/10119/9882

タイトル: Drastic suppression of the optical reflection of flash-lamp-crystallized poly-Si films with spontaneously formed periodic microstructures
著者: Ohdaira, Keisuke
Nishikawa, Takuya
Shiba, Kazuhiro
Takemoto, Hiroyuki
Matsumura, Hideki
キーワード: Flash lamp annealing
Crystallization
Reflectance
Polycrystalline silicon
Solar cell
Antireflection coatings
Transmission electron microscopy
Atomic force microscopy
発行日: 2010
出版者: Elsevier
誌名: Thin Solid Films
巻: 518
号: 21
開始ページ: 6061
終了ページ: 6065
DOI: 10.1016/j.tsf.2010.05.115
抄録: Polycrystalline Si (poly-Si) films formed by flash lamp annealing of precursor a-Si films on glass substrates have periodic surface roughness spontaneously formed through crystallization, which effectively acts to decrease optical reflection. The surface roughness initially decreases, and then reversely increases with increase in the duration of wet etching, performed to modulate the surface morphology and to reduce optical reflectance. This curious phenomenon can be understood as the selective removal of surface projections, which contain a number of voids, and as different etching rates of large-grain and fine-grain regions. The antireflection effect is enhanced not by the variation of the surface roughness, but rather by the removal of the voids near the surface. The etched poly-Si films covered with antireflection films show remarkably low average reflectance of 3% without any complicated texturing processes, which will lead to the fabrication of high-efficiency solar cells by a simple process.
Rights: NOTICE: This is the author's version of a work accepted for publication by Elsevier. Keisuke Ohdaira, Takuya Nishikawa, Kazuhiro Shiba, Hiroyuki Takemoto, and Hideki Matsumura, Thin Solid Films, 518(21), 2010, 6061-6065, http://dx.doi.org/10.1016/j.tsf.2010.05.115
URI: http://hdl.handle.net/10119/9882
資料タイプ: author
出現コレクション:c10-1. 雑誌掲載論文 (Journal Articles)

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