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このアイテムの引用には次の識別子を使用してください:
http://hdl.handle.net/10119/12138
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| タイトル: | Deposition of moisture barrier films by catalytic CVD using hexamethyldisilazane |
| 著者: | Ohdaira, Keisuke
Matsumura, Hideki |
| キーワード: | Cat-CVD
moisture barrier
hexamethyldisilazane
water-vapor transmission rate
silicon oxynitride |
| 発行日: | 2014-04-02 |
| 出版者: | IOP Publishing |
| 誌名: | Japanese Journal of Applied Physics |
| 巻: | 53 |
| 号: | 5S1 |
| 開始ページ: | 05FM03-1 |
| 終了ページ: | 05FM03-4 |
| DOI: | 10.7567/JJAP.53.05FM03 |
| 抄録: | Hexamethyldisilazane (HMDS) is utilized to deposit moisture barrier films by catalytic chemical vapor deposition (Cat-CVD). An increase in the thickness of silicon oxynitride (SiO_xN_y) films leads to a better water-vapor transmission rate (WVTR), indicating that Cat-CVD SiO_xN_y films deposited using HMDS do not severely suffer from cracking. A WVTR on the order of 10^<-3> gm^<-2>day^<-1> can be realized by a Cat-CVD SiO_xN_y film formed using HMDS on a poly(ethylene terephthalate) (PET) substrate without any stacking structures at a substrate temperature of as low as 60 ℃. X-ray reflectivity (XRR) measurement reveals that a film density of >2.0 g/cm^3 is necessary for SiO_xN_y films to demonstrate an effective moisture barrier ability. The use of HMDS will give us safer production of moisture barrier films because of its non-explosive and non-toxic nature. |
| Rights: | This is the author's version of the work. It is posted here by permission of The Japan Society of Applied Physics. Copyright (C) 2014 The Japan Society of Applied Physics. Keisuke Ohdaira and Hideki Matsumura, Japanese Journal of Applied Physics, 53(5S1), 2014, 05FM03-1-05FM03-4. http://dx.doi.org/10.7567/JJAP.53.05FM03 |
| URI: | http://hdl.handle.net/10119/12138 |
| 資料タイプ: | author |
| 出現コレクション: | z8-10-1. 雑誌掲載論文 (Journal Articles)
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| 20160.pdf | | 445Kb | Adobe PDF | 見る/開く |
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