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このアイテムの引用には次の識別子を使用してください:
http://hdl.handle.net/10119/12139
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| タイトル: | Effects of catalyst-generated atomic hydrogen treatment on amorphous silicon fabricated by Liquid-Si printing |
| 著者: | Murayama, Hiroko
Ohyama, Tatsushi
Terakawa, Akira
Takagishi, Hideyuki
Masuda, Takashi
Ohdaira, Keisuke
Shimoda, Tatsuya |
| キーワード: | Liquid silicon
atomic hydrogen
amorphous silicon
solar cell |
| 発行日: | 2014-04-22 |
| 出版者: | IOP Publishing |
| 誌名: | Japanese Journal of Applied Physics |
| 巻: | 53 |
| 号: | 5S1 |
| 開始ページ: | 05FM06-1 |
| 終了ページ: | 05FM06-4 |
| DOI: | 10.7567/JJAP.53.05FM06 |
| 抄録: | The film property distributions along the thickness direction of the catalyst-generated atomic hydrogen (Cat-H*) treatment effects on hydrogenated amorphous silicon (a-Si:H) fabricated by plasma-enhanced chemical vapor deposition (plasma-CVD) and liquid-Si printing (LSP) were systematically investigated. The a-Si:H films fabricated by LSP (L-a-Si:H) had nanosize voids; however, these films showed a decrease in void size around the surface region after Cat-H* treatment, in contrast to stable plasma-CVD films without voids. The decrease in nonaffected area by Cat-H* treatment in L-a-Si:H films improved the performance of a-Si:H solar cells with L-a-Si:H. Additionally, we achieved a 3.1% conversion efficiency for a-Si:H solar cells with L-a-Si:H as the active layer by stacking nondoped a-Si:H, fabricated by plasma-CVD, on the active layer. |
| Rights: | This is the author's version of the work. It is posted here by permission of The Japan Society of Applied Physics. Copyright (C) 2014 The Japan Society of Applied Physics. Hiroko Murayama, Tatsushi Ohyama, Akira Terakawa, Hideyuki Takagishi, Takashi Masuda, Keisuke Ohdaira and Tatsuya Shimoda, Japanese Journal of Applied Physics, 53(5S1), 2014, 05FM06-1-05FM06-4. http://dx.doi.org/10.7567/JJAP.53.05FM06 |
| URI: | http://hdl.handle.net/10119/12139 |
| 資料タイプ: | author |
| 出現コレクション: | z8-10-1. 雑誌掲載論文 (Journal Articles)
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