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Please use this identifier to cite or link to this item: http://hdl.handle.net/10119/12139

Title: Effects of catalyst-generated atomic hydrogen treatment on amorphous silicon fabricated by Liquid-Si printing
Authors: Murayama, Hiroko
Ohyama, Tatsushi
Terakawa, Akira
Takagishi, Hideyuki
Masuda, Takashi
Ohdaira, Keisuke
Shimoda, Tatsuya
Keywords: Liquid silicon
atomic hydrogen
amorphous silicon
solar cell
Issue Date: 2014-04-22
Publisher: IOP Publishing
Magazine name: Japanese Journal of Applied Physics
Volume: 53
Number: 5S1
Start page: 05FM06-1
End page: 05FM06-4
DOI: 10.7567/JJAP.53.05FM06
Abstract: The film property distributions along the thickness direction of the catalyst-generated atomic hydrogen (Cat-H*) treatment effects on hydrogenated amorphous silicon (a-Si:H) fabricated by plasma-enhanced chemical vapor deposition (plasma-CVD) and liquid-Si printing (LSP) were systematically investigated. The a-Si:H films fabricated by LSP (L-a-Si:H) had nanosize voids; however, these films showed a decrease in void size around the surface region after Cat-H* treatment, in contrast to stable plasma-CVD films without voids. The decrease in nonaffected area by Cat-H* treatment in L-a-Si:H films improved the performance of a-Si:H solar cells with L-a-Si:H. Additionally, we achieved a 3.1% conversion efficiency for a-Si:H solar cells with L-a-Si:H as the active layer by stacking nondoped a-Si:H, fabricated by plasma-CVD, on the active layer.
Rights: This is the author's version of the work. It is posted here by permission of The Japan Society of Applied Physics. Copyright (C) 2014 The Japan Society of Applied Physics. Hiroko Murayama, Tatsushi Ohyama, Akira Terakawa, Hideyuki Takagishi, Takashi Masuda, Keisuke Ohdaira and Tatsuya Shimoda, Japanese Journal of Applied Physics, 53(5S1), 2014, 05FM06-1-05FM06-4. http://dx.doi.org/10.7567/JJAP.53.05FM06
URI: http://hdl.handle.net/10119/12139
Material Type: author
Appears in Collections:z8-10-1. 雑誌掲載論文 (Journal Articles)

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