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c. マテリアルサイエンス研究科・マテリアルサイエンス系 >
c10. 学術雑誌論文等 >
c10-1. 雑誌掲載論文 >
著者: "Koyama, Koichi"
3 著者名表示.
| 発行日 | タイトル |
著者 |
|---|
| 26-Aug-2010 | Extremely low surface recombination velocities on crystalline silicon wafers realized by catalytic chemical vapor deposited SiNx/a-Si stacked passivation layers | Koyama, Koichi; Ohdaira, Keisuke; Matsumura, Hideki |
| 17-Jul-2018 | High-quality surface passivation of crystalline silicon with chemical resistance and optical transparency by using catalytic chemical vapor deposition SiN_x layers and an ultrathin SiO_x film | Tu, Huynh Thi Cam; Koyama, Koichi; Nguyen, Cong Thanh; Ohdaira, Keisuke; Matsumura, Hideki |
| 21-May-2019 | Conversion of the conduction type of a catalytic-chemical-vapor-deposited p-type a-Si by PH_3 plasma ion implantation | Tu, Huynh-Thi-Cam; Koyama, Koichi; Yamaguchi, Noboru; Suzuki, Hideo; Ohdaira, Keisuke; Matsumura, Hideki |
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