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検索結果表示: 2531-2540 / 3900.
該当アイテム:
発行日 | タイトル |
著者 |
31-Oct-2020 | 知の共創に関する仮説モデルの構築 | 所, 伸之 |
12-Jan-2017 | Indium tin oxide sputtering damage to catalytic chemical vapor deposited amorphous silicon passivation films and its recovery | Konishi, Takeo; Ohdaira, Keisuke |
3-Jun-2016 | Suppression of the epitaxial growth of Si films in Si heterojunction solar cells by the formation of ultra-thin oxide layers | Ohdaira, Keisuke; Oikawa, Takafumi; Higashimine, Koichi; Matsumura, Hideki |
22-Mar-2016 | Formation of amorphous silicon passivation films with high stability against postannealing, air exposure, and light soaking using liquid silicon | Guo, Cheng; Ohdaira, Keisuke; Takagishi, Hideyuki; Masuda, Takashi; Shen, Zhongrong; Shimoda, Tatsuya |
1-Mar-2018 | Effect of starting point formation on the crystallization of amorphous silicon films by flash lamp annealing | Sato, Daiki; Ohdaira, Keisuke |
3-Mar-2016 | Catalytic doping of phosphorus and boron atoms on hydrogenated amorphous silicon films | Seto, Junichi; Ohdaira, Keisuke; Matsumura, Hideki |
11-Jun-2018 | Passivation effect of ultra-thin SiN_x films formed by catalytic chemical vapor deposition for crystalline silicon surface | Song, Hao; Ohdaira, Keisuke |
4-Jul-2017 | Catalytic phosphorus and boron doping of amorphous silicon films for application to silicon heterojunction solar cells | Ohdaira, Keisuke; Seto, Junichi; Matsumura, Hideki |
31-Oct-2020 | 日米産業比較による参入障壁とイノベーションの相関についての検証 | 廣岡, 慎一郎; 若林, 秀樹 |
31-Oct-2020 | 地政経学的選択圧下でICTイノベーターのジレンマ : 「ノキアショック」から「ファーウェイ排除」へ | 河又, 貴洋 |
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