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Items for Author "Yamada-Takamura, Y."

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Date of IssueTitle Authors
Jul-2001 Characterization of α-phase aluminum oxide films deposited by filtered vacuum arcYamada-Takamura, Y.; Koch, F.; Maier, H.; Bolt, H.
15-Apr-2002 Hydrogen permeation barrier performance characterization of vapor deposited amorphous aluminum oxide films using coloration of tungsten oxideYamada-Takamura, Y.; Koch, F.; Maier, H.; Bolt, H.
18-Jul-2005 Atomistic study of GaN surface grown on Si(111)Wang, Z. T.; Yamada-Takamura, Y.; Fujikawa, Y.; Sakurai, T.; Xue, Q. K.
2-Aug-2006 Effect of nitridation on the growth of GaN on ZrB_2(0001)/Si(111) by molecular beam epitaxyWang, Zhi-Tao; Yamada-Takamura, Y.; Fujikawa, Y.; Sakurai, T.; Xue, Q. K.
11-Jun-2007 Silicon on insulator for symmetry-converted growthFujikawa, Y.; Yamada-Takamura, Y.; Yoshikawa, G.; Ono, T.; Esashi, M.; Zhang, P. P.; Lagally, M. G.; Sakurai, T.
Intermolecular band dispersions in single-crystalline anthracene multilayer filmsBussolotti, F.; Yamada-Takamura, Y.; Friedlein, R.
29-Sep-2011 Structure-dependent band dispersion in epitaxial anthracene filmsBussolotti, F.; Yamada-Takamura, Y.; Wang, Y.; Friedlein, R.
13-Jun-2012 Molecular order, charge injection efficiency and the role of intermolecular polar bonds at organic/organic heterointerfacesWang, Y.; Matsushima, T.; Murata, H.; Fleurence, A.; Yamada-Takamura, Y.; Friedlein, R.
5-Jun-2013 Tuning of silicene-substrate interactions with potassium adsorptionFriedlein, R.; Fleurence, A.; Sadowski, J. T.; Yamada-Takamura, Y.
16-Jan-2014 Microscopic origin of the π states in epitaxial siliceneFleurence, A.; Yoshida, Y.; Lee, C.-C.; Ozaki, T.; Yamada-Takamura, Y.; Hasegawa, Y.
12-May-2014 Core level excitations - a fingerprint of structural and electronic properties of epitaxial siliceneFriedlein, R.; Fleurence, A.; Aoyagi, K.; Jong, M. P. de; Bui, H. Van; Wiggers, F. B.; Yoshimoto, S.; Koitaya, T.; Shimizu, S.; H. Noritake; Mukai, K.; Yoshinobu, J.; Yamada-Takamura, Y.
27-May-2014 Interaction of epitaxial silicene with overlayers formed by exposure to Al atoms and O_2 moleculesFriedlein, R.; Bui, H. Van; Wiggers, F. B.; Yamada-Takamura, Y.; Kovalgin, A. Y.; Jong, M. P. de
9-Feb-2015 On the feasibility of silicene encapsulation by AlN deposited using an atomic layer deposition processBui, H. Van; Wiggers, F. B.; Friedlein, R.; Yamada-Takamura, Y.; Kovalgin, A. Y.; Jong, M. P. de
23-Jan-2017 Insights into the spontaneous formation of silicene sheet on diboride thin filmsFleurence, A.; Yamada-Takamura, Y.

 


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