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Shimoda Tatsuya

No．書籍情報
1 High-performance oxide thin film transistor fully fabricated by a direct rheology imprinting / Phan, Tue Trong, Fukada, Kazuhiro, Shimoda, Tatsuya, Applied Physics Letters, 111(22), pp.223504-1-223504-5, 2017-11-30, American Institute of Physics
2 Investigation of solution-processed bismuth-niobium-oxide films / Inoue, Satoshi, Ariga, Tomoki, Matsumoto, Shin, Onoue, Masatoshi, Miyasako, Takaaki, Tokumitsu, Eisuke, Chinone, Norimichi, Cho, Yasuo, Shimoda, Tatsuya, Journal of Applied Physics, 116(15), pp.154103-1-154103-6, 2014-10-17, American Institute of Physics
3 Effects of catalyst-generated atomic hydrogen treatment on amorphous silicon fabricated by Liquid-Si printing / Murayama, Hiroko, Ohyama, Tatsushi, Terakawa, Akira, Takagishi, Hideyuki, Masuda, Takashi, Ohdaira, Keisuke, Shimoda, Tatsuya, Japanese Journal of Applied Physics, 53(5S1), pp.05FM06-1-05FM06-4, 2014-04-22, IOP Publishing
4 Effect of Annealing and Hydrogen Radical Treatment on the Structure of Solution-Processed Hydrogenated Amorphous Silicon Films / Sakuma, Yoo, Ohdaira, Keisuke, Masuda, Takashi, Takagishi, Hideyuki, Shen, Zhongrong, Shimoda, Tatsuya, Japanese Journal of Applied Physics, 53(4S), pp.04ER07-1-04ER07-5, 2014-02-14, IOP Publishing
5 Preparation of Ruthenium Metal and Ruthenium Oxide Thin Films by a Low-Temperature Solution Process / Murakami, Yoshitaka, Tue, Phan Trong, Tsukada, Hirokazu, Li, Jinwang, Shimoda, Tatsuya, Proceedings of the 20th International Display Workshops (IDW’13), 20, pp.1573-1576, 2013-12, ITE and SID
6 Low-Temperature All-Solution-Derived Amorphous Oxide Thin-Film Transistors / Tue, Phan Trong, Li, Jinwang, Miyasako, Takaaki, Inoue, Satoshi, Shimoda, Tatsuya, IEEE Electron Device Letters, 34(12), pp.1536-1538, 2013-11-06, Institute of Electrical and Electronics Engineers (IEEE)
7 Rheology Printing for Metal-Oxide Patterns and Devices / Kaneda, Toshihiko, Hirose, Daisuke, Miyasako, Takaaki, Tue, Phan Trong, Murakami, Yoshitaka, Kohara, Shinji, Li, Jinwang, Mitani, Tadaoki, Tokumitsu, Eisuke, Shimoda, Tatsuya, Journal of Materials Chemistry C, 2(1), pp.40-49, 2013-11-01, Royal Society of Chemistry
8 Impact of UV/O_3 treatment on solution-processed amorphous InGaZnO_4 thin-film transistors / Umeda, Kenichi, Miyasako, Takaaki, Sugiyama, Ayumu, Tanaka, Atsushi, Suzuki, Masayuki, Tokumitsu, Eisuke, Shimoda, Tatsuya, Journal of Applied Physics, 113(18), pp.184509-1-184509-6, 2013-05-13, American Institute of Physics
9 Highly conductive p-type amorphous oxides from low-temperature solution Processing / Li, Jinwang, Tokumitsu, Eisuke, Koyano, Mikio, Mitani, Tadaoki, Shimoda, Tatsuya, Applied Physics Letters, 101(13), pp.132104-1-132104-4, 2012-09-26, American Institute of Physics
10 P-type conductive amorphous oxides of transition metals from solution processing / Li, Jinwang, Kaneda, Toshihiko, Tokumitsu, Eisuke, Koyano, Mikio, Mitani, Tadaoki, Shimoda, Tatsuya, Applied Physics Letters, 101(5), pp.52102-1-52102-5, 2012-07-30, American Institute of Physics
11 Pyrolytic transformation from polydihydrosilane to hydrogenated amorphous silicon film / Masuda, Takashi, Matsuki, Yasuo, Shimoda, Tatsuya, Thin Solid Films, 520(21), pp.6603-6607, 2012-07-16, Elsevier
12 Fabrication of solution-processed hydrogenated amorphous silicon single junction solar cells / Masuda, Takashi, Sotani, Naoya, Hamada, Hiroki, Matsuki, Yasuo, Shimoda, Tatsuya, Applied Physics Letters, 100(25), pp.253908-1-253908-4, 2012-06-22, American Institute of Physics
13 Characterization of polydihydrosilane by SEC-MALLS and viscometry / Masuda, Takashi, Matsuki, Yasuo, Shimoda, Tatsuya, Polymer, 53(14), pp.2973-2978, 2012-05-03, Elsevier
14 Stability of polydihydrosilane liquid films on solid substrates / Masuda, Takashi, Matsuki, Yasuo, Shimoda, Tatsuya, Thin Solid Films, 520(15), pp.5091-5096, 2012-03-25, Elsevier
15 Thermally oxidized aluminum as catalyst-support layer for vertically aligned single-walled carbon nanotube growth using ethanol / Azam, Mohd Asyadi, Fujiwara, Akihiko, Shimoda, Tatsuya, Applied Surface Science, 258(2), pp.873-882, 2011-09-10, Elsevier
16 Deposition of platinum patterns by a liquid process / Shen, Zhongrong, Li, Jinwang, Matsuki, Yasuo, Shimoda, Tatsuya, Chemical Communications, 47, pp.9992-9994, 2011-05-31, Royal Society of Chemistry
17 Ferroelectric-Gate Thin-Film Transistor Fabricated by Total Solution Deposition Process / Miyasako, Takaaki, Trinh, Bui Nguyen Quoc, Onoue, Masatoshi, Kaneda, Toshihiko, Tue, Phan Trong, Tokumitsu, Eisuke, Shimoda, Tatsuya, Japanese Journal of Applied Physics, 50, pp.04DD09-1-04DD09-6, 2011-04-20, The Japan Society of Applied Physics
18 Low Resistivity Metal Lines Formed by Functional Liquids and Successive Treatment of Catalytically Generated Hydrogen Atoms in Cat-CVD System / Kieu, Nguyen Thi Thanh, Ohdaira, Keisuke, Shimoda, Tatsuya, Matsumura, Hideki, Thin Solid Films, 519(14), pp.4565-4567, 2011, Elsevier
19 Totally solution-processed ferroelectric-gate thin-film transistor / Miyasako, Takaaki, Trinh, Bui Nguyen Quoc, Onoue, Masatoshi, Kaneda, Toshihiko, Tue, Phan Trong, Tokumitsu, Eisuke, Shimoda, Tatsuya, Applied Physics Letters, 97(17), pp.173509-1-173509-3, 2010-10-29, American Institute of Physics
20 Preparation of large thermally stable platinum nanocubes by using solvent-thermal reaction / Shen, Zhongrong, Matsuki, Yasuo, Shimoda, Tatsuya, Chemical Communications, 46, pp.8606-8608, 2010-10-04, Royal Society of Chemistry
21 A low-temperature crystallization path for device-quality ferroelectric film / Li, Jinwang, Kameda, Hiroyuki, Trinh, Bui Nguyen Quoc, Miyasako, Takaaki, Tue, Phan Trong, Tokumitsu, Eisuke, Mitani, Tadaoki, Shimoda, Tatsuya, Applied Physics Letters, 97(10), pp.102905-1-102905-3, 2010-09-10, American Institute of Physics
22 Novel technique for formation of metal lines by functional liquid containing metal nanoparticles and reduction of their resistivity by hydrogen treatment / Nguyen, Thi Thanh Kieu, Ohdaira, Keisuke, Shimoda, Tatsuya, Matsumura, Hideki, Journal of Vacuum Science and Technology B, 28(4), pp.775-782, 2010-07-07, American Vacuum Society
23 Spectral parameters and Hamaker constants of silicon hydride compounds and organic solvents / Masuda, Takashi, Matsuki, Yasuo, Shimoda, Tatsuya, Journal of Colloid and Interface Science, 340(2), pp.298-305, 2009-08-21, Elsevier
24 Solution-processed silicon films and transistors / Shimoda, Tatsuya, Matsuki, Yasuo, Furusawa, Masahiro, Aoki, Takashi, Yudasaka, Ichio, Tanaka, Hideki, Iwasawa, Haruo, Wang, Daohai, Miyasaka, Masami, Takeuchi, Yasumasa, Nature, 440(7085), pp.783-786, 2006-04-06, Nature Publishing Group

 
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