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著者:  "Matsumura, Hideki"

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37 著者名表示.

発行日タイトル 著者
12-Apr-1999 Low-temperature crystallization of amorphous silicon using atomic hydrogen generated by catalytic reaction on heated tungstenHeya, Akira; Masuda, Atsushi; Matsumura, Hideki
1-May-1999 Nanoscale metal transistor control of Fowler-Nordheim tunneling currents through 16 nm insulating channelFujimaru, Kouji; Sasajima, Ryouta; Matsumura, Hideki
24-May-1999 A metal/insulator tunnel transistor with 16 nm channel lengthSasajima, Ryouta; Fujimaru, Kouji; Matsumura, Hideki
15-Jul-1999 Anisotropic electrical conduction and reduction in dangling-bond density for polycrystalline Si films prepared by catalytic chemical vapor depositionNiikura, Chisato; Masuda, Atsushi; Matsumura, Hideki
23-Oct-2000 Ultrathin silicon nitride gate dielectrics prepared by catalytic chemical vapor deposition at low temperaturesSato, Hidekazu; Izumi, Akira; Matsumura, Hideki
1-Nov-2000 Identification of Si and SiH in catalytic chemical vapor deposition of SiH_4 by laser induced fluorescence spectroscopyNozaki, Yoshitaka; Kongo, Koichi; Miyazaki, Toshihiko; Kitazoe, Makiko; Horii, Katsuhiko; Umemoto, Hironobu; Masuda, Atsushi; Matsumura, Hideki
1-Feb-2002 Direct detection of H atoms in the catalytic chemical vapor deposition of the SiH_4/H_2 systemUmemoto, Hironobu; Ohara, Kentaro; Morita, Daisuke; Nozaki, Yoshitaka; Masuda, Atsushi; Matsumura, Hideki
1-Feb-2005 Role of Hydrogen in Polycrystalline Si by Excimer Laser AnnealingKAWAMOTO, Naoya; MATSUO, Naoto; MASUDA, Atsushi; KITAMON, Yoshitaka; MATSUMURA, Hideki; HARADA, Yasunori; MIYOSHI, Tadaki; HAMADA, Hiroki
11-Mar-2005 Air-stable n-type carbon nanotube field-effect transistors with Si_3N_4 passivation films fabricated by catalytic chemical vapor depositionKaminishi, Daisuke; Ozaki, Hirokazu; Ohno, Yasuhide; Maehashi, Kenzo; Inoue, Koichi; Matsumoto, Kazuhiko; Seri, Yasuhiro; Masuda, Atsushi; Matsumura, Hideki
22-Feb-2006 Rotational and vibrational state distribution of H_2 activated on a heated tungsten filamentUmemoto, Hironobu; Ansari, S. G.; Matsumura, Hideki
6-Nov-2007 High-Quality Polycrystalline Silicon Films with Minority Carrier Lifetimes over 5 μs Formed by Flash Lamp Annealing of Precursor Amorphous Silicon Films Prepared by Catalytic Chemical Vapor DepositionOhdaira, Keisuke; Nishizaki, Shogo; Endo, Yohei; Fujiwara, Tomoko; Usami, Noritaka; Nakajima, Kazuo; Matsumura, Hideki
6-Dec-2007 Formation of Highly Uniform Micrometer-Order-Thick Polycrystalline Silicon Films by Flash Lamp Annealing of Amorphous Silicon on Glass SubstrateOhdaira, Keisuke; Endo, Yohei; Fujiwara, Tomoko; Nishizaki, Shogo; Matsumura, Hideki
15-Jan-2008 Poly-Si films with long carrier lifetime prepared by rapid thermal annealing of Cat-CVD amorphous silicon thin filmsOhdaira, Keisuke; Abe, Yuki; Fukuda, Makoto; Nishizaki, Shogo; Usami, Noritaka; Nakajima, Kazuo; Karasawa, Takeshi; Torikai, Tetsuya; Matsumura, Hideki
14-Nov-2008 Formation of Several-Micrometer-Thick Polycrystalline Silicon Films on Soda Lime Glass by Flash Lamp AnnealingOhdaira, Keisuke; Fujiwara, Tomoko; Endo, Yohei; Nishizaki, Shogo; Matsumura, Hideki
30-Apr-2009 Precursor Cat-CVD a-Si films for the formation of high-quality poly-Si films on glass substrates by flash lamp annealingOhdaira, Keisuke; Shiba, Kazuhiro; Takemoto, Hiroyuki; Fujiwara, Tomoko; Endo, Yohei; Nishizaki, Shogo; Jang, Young Rae; Matsumura, Hideki
12-Jun-2009 Drastic Improvement of Minority Carrier Lifetimes Observed in Hydrogen-Passivated Flash-Lamp-Crystallized Polycrystalline Silicon FilmsOhdaira, Keisuke; Takemoto, Hiroyuki; Shiba, Kazuhiro; Matsumura, Hideki
25-Aug-2009 Explosive crystallization of amorphous silicon films by flash lamp annealingOhdaira, Keisuke; Fujiwara, Tomoko; Endo, Yohei; Nishizaki, Shogo; Matsumura, Hideki
2010 Drastic suppression of the optical reflection of flash-lamp-crystallized poly-Si films with spontaneously formed periodic microstructuresOhdaira, Keisuke; Nishikawa, Takuya; Shiba, Kazuhiro; Takemoto, Hiroyuki; Matsumura, Hideki
2010 Flash-lamp-crystallized Polycrystalline Silicon Films with Remarkably Long Minority Carrier LifetimesOhdaira, Keisuke; Takemoto, Hiroyuki; Nishikawa, Takuya; Matsumura, Hideki
Apr-2010 Polycrystalline Si films with unique microstructures formed from amorphous Si films by non-thermal equilibrium flash lamp annealingOhdaira, Keisuke; Nishikawa, Takuya; Shiba, Kazuhiro; Takemoto, Hiroyuki; Matsumura, Hideki
Apr-2010 Advantage of plasma-less deposition: Cat-CVD fabrication of a-Si TFT with current drivability equivalent to poly-Si TFTMatsumura, Hideki; Ohdaira, Keisuke; Nishizaki, Shogo
20-Apr-2010 Selection of Material for the Back Electrodes of Thin-Film Solar Cells Using Polycrystalline Silicon Films Formed by Flash Lamp AnnealingOhdaira, Keisuke; Fujiwara, Tomoko; Endo, Yohei; Shiba, Kazuhiro; Takemoto, Hiroyuki; Matsumura, Hideki
25-Jun-2010 Variation of Crystallization Mechanisms in Flash-Lamp-Irradiated Amorphous Silicon FilmsOhdaira, Keisuke; Nishikawa, Takuya; Matsumura, Hideki
30-Jun-2010 Thin-film polycrystalline silicon solar cells formed by flash lamp annealing of a-Si filmsEndo, Yohei; Fujiwara, Tomoko; Ohdaira, Keisuke; Nishizaki, Shogo; Nishioka, Kensuke; Matsumura, Hideki
7-Jul-2010 Novel technique for formation of metal lines by functional liquid containing metal nanoparticles and reduction of their resistivity by hydrogen treatmentNguyen, Thi Thanh Kieu; Ohdaira, Keisuke; Shimoda, Tatsuya; Matsumura, Hideki
26-Aug-2010 Extremely low surface recombination velocities on crystalline silicon wafers realized by catalytic chemical vapor deposited SiNx/a-Si stacked passivation layersKoyama, Koichi; Ohdaira, Keisuke; Matsumura, Hideki
2011 Microstructure of Polycrystalline Silicon Films Formed through Explosive Crystallization Induced by Flash Lamp AnnealingOhdaira, Keisuke; Ishii, Shohei; Tomura, Naohito; Matsumura, Hideki
2011 Advantage of Plasma-Less Deposition in Cat-CVD to the Performance of Electronic DevicesMatsumura, Hideki; Hasegawa, Tomoaki; Nishizaki, Shogo; Ohdaira, Keisuke
2011 Flash-Lamp-Crystallized Polycrystalline Silicon Films with High Hydrogen Concentration Formed from Cat-CVD a-Si FilmsOhdaira, Keisuke; Tomura, Naohito; Ishii, Shohei; Matsumura, Hideki
2011 Low Resistivity Metal Lines Formed by Functional Liquids and Successive Treatment of Catalytically Generated Hydrogen Atoms in Cat-CVD SystemKieu, Nguyen Thi Thanh; Ohdaira, Keisuke; Shimoda, Tatsuya; Matsumura, Hideki
3-Mar-2016 Catalytic doping of phosphorus and boron atoms on hydrogenated amorphous silicon filmsSeto, Junichi; Ohdaira, Keisuke; Matsumura, Hideki
3-Jun-2016 Suppression of the epitaxial growth of Si films in Si heterojunction solar cells by the formation of ultra-thin oxide layersOhdaira, Keisuke; Oikawa, Takafumi; Higashimine, Koichi; Matsumura, Hideki
4-Jul-2017 Catalytic phosphorus and boron doping of amorphous silicon films for application to silicon heterojunction solar cellsOhdaira, Keisuke; Seto, Junichi; Matsumura, Hideki
11-Sep-2017 Passivation of textured crystalline silicon surfaces by catalytic CVD silicon nitride films and catalytic phosphorus dopingOhdaira, Keisuke; Cham, Trinh Thi; Matsumura, Hideki
30-Oct-2017 Super water-repellent treatment of various cloths by deposition of catalytic-CVD polytetrafluoroethylene filmsMatsumura, Hideki; Mishiro, Mai; Takachi, Michihisa; Ohdaira, Keisuke
17-Jul-2018 High-quality surface passivation of crystalline silicon with chemical resistance and optical transparency by using catalytic chemical vapor deposition SiN_x layers and an ultrathin SiO_x filmTu, Huynh Thi Cam; Koyama, Koichi; Nguyen, Cong Thanh; Ohdaira, Keisuke; Matsumura, Hideki
21-May-2019 Conversion of the conduction type of a catalytic-chemical-vapor-deposited p-type a-Si by PH_3 plasma ion implantationTu, Huynh-Thi-Cam; Koyama, Koichi; Yamaguchi, Noboru; Suzuki, Hideo; Ohdaira, Keisuke; Matsumura, Hideki

 


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